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A-Tech System

175-25 Cheongcheon-Dong 2, Bupyeong-Gu,Incheon,Incheon,South Korea South Korea

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Brochures: 10

In-line Sputter System for Large Area Deposition(Inline SPT-370)

Optical coatings Hard coatings Metal coatings Polymer surface modifications Coatings for flat panel display electorates

Cluster system for Oxide and Metal sputtering(ClusterSPT-200)

Metal, ceramic, and alloy depositions for R&D in OLED fields. Cluster sputtering system for TCO deposition with two sputtering chambers and one glove

Compact Magnetron Sputter System (Compact Sputter-75S)

Applicable to various R&D fields that sputter deposition of metals and ceramic materials is necessary.

Standard Magnetron Sputter with 4x3" or 3x4" Guns (Flexlab System 100)

Metal, ceramic, and alloy deposition for basic research in various fields. Deposition of metallic and inorganic layers is not only available.

ICP CVD system for Graphene and Boron Carbide Layers(PECVD Lab 200)

Graphene synthesis. Multi-functional CVD system combined with ICP CVD and probe station.

Thermal CVD System with Uniform Heating Zone(CVD Lab-50N)

CNTs growth for field emission display device. Small thermal CVD system for carbon nano tube synthesis.

High Density Plasma Etching System for Magnetic Materials(Etcher-100M)

Metal, oxide, magnetic materials etching. TCP etching system for R&D and small scale production.

High Density Plasma Etching System for Waveguides(Cluster Etch-300)

Metal etching, Silica etching, Polymer etching. TCP etching system with 3 chambers for R&D and small scale production.

Arc Ion Plating System(Vaccum Arc Pilot-12H)

Metal coating. Metal Nitride coating.

PECVD-PVD Cluster System for Graphene Synthesis (Graphene Cluster Lab 200)

Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis.

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