Product Description

China New Metal Materials Technology Co.,Ltd(hereinafter referred to as CNM), is one of the Chinese Nonferrous Metal Industry company specializing in research and develop of new materials. As the initiator of leading enterprises in the industry,The company has first-class equipment, advanced technology, strong research team and modern management concepts, to build Chinese and even the world's most influential non-ferrous metal new materials, new technology and new process development and production center.After years of unremitting efforts,CNM has under it division Departments of Coating materials, Sputtering target, Metal powder and Alloy materials, High purity metal materials, and developed many series of new materials, which about one hundred kinds of product brands have been applied widely in such industries like aviation and space, military project, infotronics, vacuum coating, magnetron sputtering, metallurgy, functional material, biological medicine and new energy.Our products are exported to Korea, Japan, Europe, the United States and Southeast Asia, highly praised by customers, and we will make persistent efforts, to provide a full range of services with high quality products. We are sure you will be satisfied with CNM.

Magnetron sputtering target                        

（CNM could provide high quality target material for the field of electrical and semiconductor devices，flat panel display , architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.）

High purity metal sputtering target material (3N*6N):

Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, Graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, iridium, Y, Ce, La, Yb, Gd, Pt, etc..

High density ceramic target (3N*5N):

ITO target,  AZO target, IGZO target, magnesium oxide target, yttrium oxide target, iron oxide target, nickel oxide, chromium oxide, zinc oxide, zinc sulfide, cadmium sulfide, molybdenum disulfide, silicon dioxide, silicon monoxide, zirconium dioxide, niobium pentoxide, titanium dioxide, hafnium oxide, titanium boride, zirconium diboride, tungstic oxide, aluminum oxide, tantalum pentoxide, magnesium fluoride, zinc selenide, aluminum nitride target, silicon nitride target, boron nitride, titanium nitride, silicon carbide, lithium niobate, praseodymium titanate, barium titanate, lanthanum titanate, and so on.

Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology—inert gas protection hot isostatic pressing sintering technology, the relative density is grater than ****9%. In addition, CNM could provide with the metalizing process of the target and unbounded services.

High purity alloy sputtering target: nickel-vanadium alloy, nickel-chromium, titanium-aluminum alloy, silicon-aluminum alloy, copper-indium alloy target, copper-gallium alloy target, copper-indium-gallium alloy, copper-indium-gallium-selenium alloy, stainless steel, zinc-aluminum alloy, tungsten-titanium alloy, iron-cobalt alloy, etc.

Note:CNM product high purity alloy sputtering target: tiny grain size number (*****0um), high relative density (****9.9%), high purity (*9.***9.**9%). 

In addition, CNM provides with the metalizing process of the target materials and unbounded services.

Vacuum coating material

(plate: complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperature dielectric coating, optical film, laser aid filter, preservative, transparent conducting film，discolor film, good wide band anti-reflection film，ferromagnetic film, visible region anti-reflection, infrared anti-reflection film, spectro-film，multilayer film, high reflectance coating，resistive film, high temperature reflectance coating, cold light coating.

High quality vacuum coating material：（4N*5N）

1.      Oxide：silicon monoxide, silicon dioxide, titanium dioxide, zirconium dioxide, hafnium dioxide, titanium monoxide, titanium pentoxide, niobium pentoxide, tantalum pentoxide, yttrium oxide, etc.

2.      fluoride：neodymium fluoride, barium fluoride, cerium fluoride, magnesium fluoride, lanthanum fluoride, yttrium fluoride, ytterbium fluoride, erbium fluoride, etc.

3.      other compound: zinc sulfide, zinc selenide, titanium nitride, silicon carbide, lanthanum titanate, barium titanate, strontium titanate, praseodymium titanate, cadmium sulfide, etc.

4.      metal coating material: high purity aluminum, high purity copper, high purity titanium, high purity silicon, high purity gold, high purity silver, high purity indium, high purity magnesium, high purity zinc, high purity platinum, high purity germanium, high purity nickel, gold-germanium alloy, gold-nickel alloy, nickel-chromium alloy, titanium-aluminum alloy, copper-indium-gallium alloy, copper-indium-gallium-selenium alloy, zinc-aluminum alloy, etc.

Note: the vacuum coating materials produced by CNM boasts the following advantages: high purity, no spilling, low deflation, well-distributed film, strong adhesion, better resistance to corrosion, uniform color, and so on.