Product Description

laser pattern generators are designed for making masks, reticles and direct writing on a wafer without limitationon a die size, provide the possibility to make masks with high precision. Time of layer writting depends on die size nly and it is irrespective of the layer layout. High-end pattern generators feature higher accuracy, bigger substrates, capability to write phase shifting masks, as well as optical proximity masks. main features of the generators: - improved print with nested grid and control of laser spot intensity levels; - original technique of making master patterns -electro-optic system to control laser radiation - X-Y stage on magneto-air cushion with the use of linear step motors and laser interferometers