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Phantom III Reactive Ion Etch (RIE) System
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Phantom III Reactive Ion Etch (RIE) System

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Trion Technology

Trion Technology

USA

1333 Trust Points
1st Year

Contact Person Addison

Clearwater, Florida

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Product Description

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.

Country: USA
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Phantom III Reactive Ion Etch (RIE) System

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Phantom III Reactive Ion Etch (RIE) System Phantom III Reactive Ion Etch (RIE) System

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