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Phantom III Reactive Ion Etch (RIE) System

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers,

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Phantom III Reactive Ion Etch (RIE) System

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers,

Contact Now

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    Contact Person : Addison

    Company:Trion Technology

    Address:Clearwater, Florida,

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    Addison < Trion Technology >
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