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Phantom III Reactive Ion Etch (RIE) System

USA

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Product Description

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform. Phantom III Reactive Ion Etch (RIE) System

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Contact Person : Addison

Company:Trion Technology

Address:Clearwater, Florida, USA,

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