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Trion Technology

Clearwater,Florida,USA

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1st Year

Phantom III Reactive Ion Etch (RIE) System

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USA

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Product Description

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform. Phantom III Reactive Ion Etch (RIE) System