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ANNEALSYS

Rue de la Vieille Poste,MONTPELLIER,France,France France

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Brochures: 10

ASOne_EN_AS0300B21

The AS-One RTP system can process samples up to 150 mm diameter. The machine has been specially developed to meet the requirements of universities, re

014011812033252da6d94b060e.pdf

The AS-One RTP system can process samples up to 150 mm diameter. The machine has been specially developed to meet the requirements of universities, re

ASMicro_EN_AS0100B18

The AS-Micro system is a three-inch rapid thermal processor dedicated research applications. It can process up to 3-inch diameter wafers. A 3-inch dia

014011812133452da6fee24287.pdf

The AS-Micro system is a three-inch rapid thermal processor dedicated research applications. It can process up to 3-inch diameter wafers. A 3-inch dia

014011812133452da6fee24287.pdf

The AS-Micro system is a three-inch rapid thermal processor dedicated research applications. It can process up to 3-inch diameter wafers. A 3-inch dia

MC050_EN_AS4005B12

The Annealsys MC050 system is a 2-inch ALD/CVD (Atomic Layer Deposition and Chemical Vapor Deposition) reactor especially developed to meet the requir

014011812291752da739d1b530.pdf

The Annealsys MC050 system is a 2-inch ALD/CVD (Atomic Layer Deposition and Chemical Vapor Deposition) reactor especially developed to meet the requir

MC100_EN_AS5B14

The Annealsys MC100 system is a 4-inch CVD reactor especially developed to meet the requirements of research and development units. It is designed for

014011812501152da7883af0cb.pdf

The Annealsys MC100 system is a 4-inch CVD reactor especially developed to meet the requirements of research and development units. It is designed for

014011812291752da739d1b530.pdf

The Annealsys MC050 system is a 2-inch ALD/CVD (Atomic Layer Deposition and Chemical Vapor Deposition) reactor especially developed to meet the requir

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