Product Description

The AS-Micro system is a three-inch rapid thermal processor dedicated research applications. It can process up to *-inch diameter wafers. A *-inch diameter susceptor can be provided upon request to process samples up to *-inch diameter. The system is a low cost bench top tool but is provided with all necessary features for process development.

The process chamber is made of a quartz tube with stainless steel flanges. The furnace uses tubular infrared halogen lamps and provides fast ramp rates. The horizontal motion door with the quartz tray provides easy loading and unloading of the substrate as well as of thermocouple installation.

The thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range.

The system is provided with one purge gas line and can receive up to 4 process gas lines with mass flow controllers.

The system has vacuum capability and is equipped with a vacuum valve and vacuum constraint gauge. It allows running process from low pressure to atmosphere. The AS-Micro can receive a turbo pump as an optional feature.

The system is provided with full PC control with Windows compatible software for editing recipes and process data logging.



Performance characteristics:

Temperature range: RT to ***0°C

Ramp rate up to **0°C/s on *-inch diameter silicon substrate, **0°C/s on *-inch

Gas mixing capability with mass flow controllers

Vacuum range: Atm to ***2 Torr (***6 Torr with optional turbo pump)

Thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range.

Optional pyrometer control.

The system is provided with full PC control with Windows compatible software.