Description

Hard coating, Ferromagnetic devices

Special Features

FVAS system for small scale production with *0 degree macro-particle filtering.
Magnet array designed specially for arc stabilization.
Constantly exhibits high ionization ratio.
Average throughput Up to 5,**0 per year.

Specifications

Wafer capacity : 1 X 4"
Dimension : 1,**0L × 1,**0H × **5W (mm3)
Power : DC **0V/*0A for electromagnetic field
DC **0W for arc discharge(automatically switchable)
Gas : dependent on deposition process
Pump : rotary(**0 l/min) & turbo(**0 l/s) or DP(1,**0 l/s)